The rumor of "Tsinghua University EUV project has huge ASML's photocoloics and realizes the localization of photocaliosity", and the Chinese electronic institution responded that the project is not a domestic optical optical lightThe engraving factory is Beijing High Energy Synchronous Radiation Light Source Project.
According to the surging news earlier reports, a video widely spread on the major social platforms stated that the research team of Beijing Tsinghua University overtaking is overtaking, breaking through American technology blockThe domestic EUV light carved machine was made breakthrough and said that the project had landed in Xiong'an New District, Baoding City, Hebei Province.
China Electronics Engineering Design Institute Co., Ltd. on Monday (September 18) to clarify through the official WeChat public account that the above projects are not online Chinese domestic lithography machine factories, but Beijing high -energy synchronous radiation light source projects(HEPS).
According to the China Electronic Academy, HEPS is located on the banks of Huairou Yanqi Lake, Beijing. It is the national "13th Five -Year Plan" major technology infrastructure. It is the first high -energy synchronous radiation light source in China.One of the fourth generation synchronous radiation light source.The project began construction as early as 2019 and will be put into use at the end of 2025.
China Electronics Academy said that HEPS can be regarded as a giant X -ray machine with a super precision, ultra -high speed, a strong penetrating power.Observe the micro -world from the standards of molecules and atoms.
The China Electronic Academy emphasized that HEPS is a large scientific device for scientific experiments, not the optical carved factory passed by the Internet.